Ultra High Thermal Conductivity Diamond Wafer
Ultra High Thermal Conductivity Diamond Wafer
High mechanical strength Excellent electrical insulation
Low dielectric constant Increased power density
Technical Specifications
Preparation Method MPCVD
Dimension 1-4 inch customizable
Thickness 0.3-1.0mm
Thickness Tolerance ±0.05mm
Surface Roughness 1-30nm
Thermal Conductivity 1200-2000W/mk @300K
Thermal Expansion Coefficient 1X10-6@300K
Specific Heat Capacity 0.502J/gK@300K
Density 3.52(X103Kg*m-3)
Vicker's Hardness 65-100GPa
Young's Modulus 1050GPa